Three electron beam lithography techniques have been proposed and realized practical use: the point beam method, the variable-shaped beam (VSB) method, and the character projection (CP) method. The VSB method, which draws variable rectangular patterns, is mainly used to achieve high precision and throughput, but rectangles approximate the pattern edges. In contrast, using the CP method, which can draw basic patterns such as circles and triangles in advance, like stamping, we will realize photonic nanodevices and nanostructures through high-resolution and high-speed large-area drawing for future information society.