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Publications List (2004)

 

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Journal Papers

[1]     Kazumasa Sakurai, Hideki Yokoi, Tetsuya Mizumoto, Daisuke Miyashita, and Yoshiaki Nakano, "Fabrication of semiconductor laser for integration with optical isolator", Japanese Journal of Applied Physics, vol. 43, no. 4A, pp. 1388-1392, April 2004.

[2]     Ning Li, Ichitaro Waki, Chaiyasit Kumtornkittikul, Ji-Hao Liang, Masakazu Sugiyama, Yukihiro Shimogaki, and Yoshiaki Nakano, "Fabrication of AlGaN-based waveguides by inductively coupled plasma etching", Japanese Journal of Applied Physics, vol. 43, no. 10B, pp. L1340-L1342, September 24, 2004.

[3]     —À‹gèM, ù‘qŒ«, ’†–ì‹`º, "‚‘¬ŒõƒƒCƒ„ƒŒƒX’ÊM—p”­ŒõƒfƒoƒCƒX (High-speed light emitting diodes for optical wireless communications)", ŒõŠw, vol. 33, no. 10, pp. 601-603, 2004”N10ŒŽ.

[4]     Katsumasa Horiguchi, Yoshitada Katagiri, Yoshiaki Nakano, Ikutaro Kobayashi, and Yasuyuki Mitsuoka, "Theoretical consideration of surface-plasmon polaritons based on dynamics of electric dipoles formed on metal surfaces", Proceedings of SPIE, "Optomechatronic Micro/Nano Components, Devices, and Systems," vol. 5604, pp. 185-194, Philadelphia, Pennsylvania, October 27-28, 2004.

[5]     Tadashi Suga, Takao Niimi, Ikutaro Kobayashi, Yoshitada Katagiri, Yoshiaki Nakano, and Yasuyuki Mitsuoka, "Investigation of splitting SPP modes propagating at metal-dielectric interface", Proceedings of SPIE, "Optomechatronic Micro/Nano Components, Devices, and Systems," vol. 5604, pp. 173-184, Philadelphia, Pennsylvania, October 27-28, 2004.

[6]     Hiromasa Shimizu and Yoshiaki Nakano, "First demonstration of TE mode nonreciprocal propagation in an InGaAsP/InP active waveguide for an integratable optical isolator", Japanese Journal of Applied Physics, vol. 43, no. 12A, pt. 2 (Express Letter), pp. L1561-L1563, November 12, 2004.

[7]     S. Inasawa, M. Sugiyama and Y. Yamaguchi, gLaser-Induced Shape Transformation of Gold Nanoparticles below the Melting Point: The Effect of Surface Melting,h J. Phys. Chem. B 109, pp. 3104-3111 (2004).@

[8]     T. Nakano, M. Sugiyama, Y. Nakano and Y. Shimogaki:
The Role of the Surface Adsorption Layer during MOVPE Growth Analyzed by the Flow Modulation Method, J. Crystal Growth, 472
, pp. 15-23 (2004).@

[9]     R. Shimizu, M. Ogino, M. Sugiyama and Y. Shimogaki, gAnalysis and modeling of low pressure chemical vapor deposition of phosphorus-doped polysilicon in commercial scale reactor,h J. Vac. Sci. Technol. A22, pp. 1763-1766 (2004).@

[10]  M. Sugiyama, S. Tagawa, H. Ohmura and S. Koda, gSupercritical water oxidation of a carbon particle by Schlieren photography,h AIChE. J., 50, pp. 2082-2089 (2004).@

[11]  A. Morita, M. Sugiyama, H. Kameda, D. R. Hanson and S. Koda, gMass accommodation coefficient of water: Molecular dynamics simulation and revised analysis of droplet train/flow reactor experiment,h J. Phys. Chem. B 108, pp. 9111-9120 (2004).@

[12]  T. Hirose, T. Omatsu, M. Sugiyama, S. Inasawa and S. Koda, gAu-nano-particles production by pico-second ultra-violet laser deposition in Au-ion doped PMMA film,h Chem. Phys. Lett. 390, pp. 166-169 (2004).@

[13]  D. R. Hanson, M. Sugiyama, A. Morita, gRevised Kinetics in the Droplet-Train Apparatus Due to a Wall Loss,h J. Phys. Chem. A, 108, 3739-3744 (2004).@

[14]  M. Sugiyama, M. Kataoka, H. Ohmura, H. Fujiwara and S. Koda, gOxidation of carbon particles in supercritical water: rate and mechanism,h Ind. Eng. Chem. Res., 43, pp. 690-699 (2004).@

[15]  M. Sugiyama, H. J. Oh, Y. Nakano and Y. Shimogaki, gPolycrystals growth on dielectric masks during InP/GaAs selective MOVPE,h J. Crystal Growth, 261 pp. 411-418 (2004).

[16]  H. J. Oh, M. Sugiyama, Y. Nakano and Y. Shimogaki, gThe effect of group V precursor on selective area MOVPE of InP/GaAs-related materials,h J. Crystal Growth, 261 (2-3) pp. 419-426 (2004).

[17]  I. T. Im, H. J. Oh, M. Sugiyama, Y. Nakano and Y. Shimogaki, gFundamental kinetics determining growth rate profiles of In and GaAs in MOCVD with horizontal reactor,h J. Crystal Growth, 261 (2-3) pp. 214-224 (2004).@

 

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International Conferences

[18]  Masakazu Sugiyama, Ho-Jin Oh, Ik-Tae Im, Yoshiaki Nakano, and Yukihiro Shimogaki, "Measurement of surface reaction rate constants and reactor-scale simulation of growth rate and composition in InGaAsP MOVPE", Workbook, 12th International Conference on Metal-Organic Vapor Phase Epitaxy, p. 29, Maui, Hawaii, May 30-June 4, 2004.

[19]  Takayuki Nakano, Masakazu Sugiyama, Yoshiaki Nakano, and Yukihiro Shimogaki, "The role of the surface adsorption layer during InGaAsP MOVPE growth analyzed by the flow modulation method", Workbook, 12th International Conference on Metal-Organic Vapor Phase Epitaxy,@ p. 9, Maui, Hawaii, May 30-June 4, 2004.

[20]  Takafumi Ohtsuka and Yoshiaki Nakano, "Strain distribution and band structure of mass-transported InAsP quantum wires buried in InGaAsP/InP", Conference Proceedings, 16th International Conference on Indium Phosphide and Related Materials (IPRM '04), P1-35, pp. 253-256, Kagoshima, Japan, May 31-June 4, 2004.

[21]  Mitsuru Takenaka, Maura Raburn, and Yoshiaki Nakano, "Improvement of optical flip-flop characteristics of compact directionally-coupled bistable laser diode", Conference Proceedings, 16th International Conference on Indium Phosphide and Related Materials (IPRM '04), WA3-4, pp. 523-526, Kagoshima, Japan, May 31-June 4, 2004.

[22]  Abdullah Al Amin, Xueliang Song, Kenji Sakurai,@ Masakazu Sugiyama, and Yoshiaki Nakano, "Integration of semiconductor optical amplifiers@ with an arrayed waveguide grating@ demultiplexer by MOVPE selective area growth", Technical Digest, Topical Meeting on Integrated Photonics Research (IPR 2004), IFB4, San Francisco, California, June 30-July 2, 2004.

[23]  Yoshiki Awa, Tomoyoshi Ide, Taro Arakawa, Nobuo Haneji, Kunio Tada, Masakazu Sugiyama, Hiromasa Shimizu, Yukihiro Shimogaki, and Yoshiaki Nakano, "High etch rate and improved etched surface morphology@ in electron cyclotron resonance-reactive ion etching of GaN@ by cyclic injection of CH4/H2/Ar and O2 with constant Ar flow", Extended Abstracts of the 23rd Electronic Materials Symposium, C7, pp. 45-48, Izu-Nagaoka, Shizuoka, July 7-9, 2004.

[24]  Noriaki Waki, Takayuki Nakano, Ho-jin Oh, Masakazu Sugiyama, Yoshiaki Nakano, and Yukihiro Shimogaki, "Understanding the abnormal growth of InP-related materials in selective-area MOVPE", Extended Abstracts of the 23rd Electronic Materials Symposium, D5, pp. 69-72, Izu-Nagaoka, Shizuoka, July 7-9, 2004.

[25]  Takayuki Nakano, Masakazu Sugiyama, Yoshiaki Nakano, Yukihiro Shimogaki, "Examination of sub-surface in MOVPE by time modulation growth", Extended Abstracts of the 23rd Electronic Materials Symposium, D8, pp. 79-82, Izu-Nagaoka, Shizuoka, July 7-9, 2004.

[26]  Shin Kaneko, Hiromasa Shimizu, Xiaoping Zhou, and Yoshiaki Nakano, "Photo-induced phase modulation in InGaAs/InGaAlAs electro-absorption modulators for all-optical wavelength conversion", Technical Digest, the Ninth Optoelectronics and Communications Conference (OECC 2004), 14F1-5, pp. 550-551, Yokohama, July 12-16, 2004.

[27]  Eric Gouardes and Yoshiaki Nakano, "Mux/demux filter concatenation in an all-optical burst switching (OBS) node", Technical Digest, the Ninth Optoelectronics and Communications Conference (OECC 2004), 15A2-3, pp. 590-591, Yokohama, July 12-16, 2004.

[28]  Hiromasa Shimizu and Yoshiaki Nakano, "Fabrication of a semiconductor-waveguide-type optical isolator based on the nonreciprocal loss shift", Abstract Book of the Third International Conference on Physics and Applications of Spin-Related Phenomena in Semiconductors (PASPS III), Paper 128, pp. 137-138, Santa Barbara, California, July 21-23, 2004.

[29]  Mitsuru Takenaka, Maura Raburn, and Yoshiaki Nakano, "(Invited Paper) Simulation of semiconductor all-optical flip-flops using the finite-difference beam-propagation method", Proceedings of the 4th International Conference on Numerical Simulation of Optoelectronic Devices (NUSOD 2004), TuC1, pp. 15-18, Santa Barbara, California, August 24-26, 2004.

[30]  Abdullah Al Amin, Takeshi Doi, Kenji Sakurai, Zhenrui Zhang, Xueliang Song, Masakazu Sugiyama, and@ Yoshiaki Nakano, "Simulation of bandgap in MOVPE selective area growth of InGaAsP-based photonic integrated circuits", Proceedings of the 4th International Conference on Numerical Simulation of Optoelectronic Devices (NUSOD 2004), TuC5, pp. 25-26, Santa Barbara, California, August 24-26, 2004.

[31]  Maura Raburn, Mitsuru Takenaka, and Yoshiaki Nakano, "Simulation of distributed Bragg reflector multi-mode interference bistable laser diodes for cascadable all-optical flip-flops", Proceedings of the 4th International Conference on Numerical Simulation of Optoelectronic Devices (NUSOD 2004), TuC3, pp. 21-22, Santa Barbara, California, August 24-26, 2004.

[32]  Xueliang Song, Zhenrui Zhang, and Yoshiaki Nakano, "Monolithically integrated SOA-MZI all-optical switch with high-yield regrowth-free selective area MOVPE", Technical Digest, 30th European Conference on Optical Communication (ECOC 2004), Mo3.4.5, pp. 34-35, Stockholm, Sweden, September 5-9, 2004.

[33]  Mitsuru Takenaka, Maura Raburn, and Yoshiaki Nakano, "All-optical flip-flop operation via two-mode bistability of multimode interference bistable laser diodes", Technical Digest, 30th European Conference on Optical Communication (ECOC 2004), Tu4.4.5, pp. 254-255, Stockholm, Sweden, September 5-9, 2004.

[34]  Mitsuru Takenaka, Maura Raburn, and Yoshiaki Nakano, "All-optical flip-flop multimode interference bistable laser diodes with reverse biased saturable absorbers", Conference Digest, 19th IEEE International Semiconductor Laser Conference, WC4, pp. 26-27, Matsue, Shimane, September 22-25, 2004.

[35]  Hiromasa Shimizu and Yoshiaki Nakano, "First demonstration of TE mode nonreciprocal propagation in a semiconductor active waveguide for an integratable optical isolator", Conference Digest (Post Deadline Papers), 19th IEEE International Semiconductor Laser Conference, SaB1, pp. 1-2, Matsue, Shimane, September 22-25, 2004.

[36]  Ning Li, Ichitaro Waki, Masakazu Sugiyama, Yukihiro Shimogaki, and Yoshiaki Nakano, "Fabrication of group III-nitride waveguides by inductively coupled plasma etching", Meeting Abstracts, 206th Meeting of the Electro-Chemical Society, M1, Paper 1237, Oahu, Hawaii, October 3-8, 2004.

[37]  C. Kumtornkittikul, I. Waki, L. Ning, H. Otani, M. Sugiyama, Y. Nakano, gWaveguide structure for ultrafast photonic devices utilizing intersubband absorption in GaN-based MOVPE-grown multiple quantum wells,h IEEE LEOS Annual Meeting Conference Proceedings (IEEE Cat. No.04CH37581), pt. 1, pp. 140-1 Vol.1 (2004).@

[38]  Yoshiki Awa, Tomoyoshi Ide, Taro Arakawa, Nobuo Haneji, Kunio Tada, Masakazu Sugiyama, Hiromasa Shimizu, Yukihiro Shimogaki, and Yoshiaki Nakano, "Electron cyclotron resonance reactive ion etching of GaN by cyclic injection of CH4/H2/Ar and O2 with constant Ar flow for high etch rate and improvement of etched surface morphology", Digest of Papers, International Microprocesses and Nanotechnology Conference (MNC 2004), 28P-7-22, Osaka, Japan, October 26-29, 2004.

[39]  Tomonari Shioda, Takeshi Doi, Abdullah Al Amin, Xue-Liang Song, Masakazu Sugiyama, Yukihiro Shimogaki, and Yoshiaki Nakano, "Simulation and design of the emission wavelength of multiple quantum well structures fabricated by selective area metal-organic vapor phase epitaxy", Abstract of the 3rd Asian Conference on Chemical Vapor Deposition, Taipei, Oct. 12-14, 2004, p. 63 (2004).

[40]  Noriaki Waki, Takayuki Nakano, Masakazu Sugiyama, Yoshiaki Nakano, and Yukihiro Shimogaki, "Role of surface diffusion during selective area MOVPE growth of compound semiconductor", Abstract of the 3rd Asian Conference on Chemical Vapor Deposition, Taipei, Oct. 12-14, 2004, p. 51 (2004).

[41]  Chaiyasit Kumtornkittikul, Ichitaro Waki, Ning Li, Masakazu Sugiyama,@ Yukihiro Shimogaki, and Yoshiaki Nakano, "GaN/AlN multiple quantum wells and waveguide fabrication for ultrafast photonic devices utilizing intersubband transition", Conference Proceedings, IEEE Region 10 Conference (TENCON 2004), TD-10-2,0899,@ pp. 140-143, Chiang Mai, Thailand, November 21-24, 2004.

[42]  Hiromasa Shimizu and Yoshiaki Nakano, "Fabrication of a TE mode semiconductor-waveguide-type optical isolator based on the@ nonreciprocal loss shift", Abstracts, MRS Fall Meeting, J4.7, p. 276, Boston, Massachusetts, November 29-December 3, 2004.

[43]  Xueliang Song, Foo Cheong Yit, Zhenrui Zhang, and Yoshiaki Nakano, "Monolithic MZI all-optical switch with selective area MOVPE", Abstract Book, 2004 Conference on Optoelectronic and Microelectronic Materials and Devices (COMMAD 04), T6-1, p. 99, Brisbane, Australia, December 8-10, 2004.

[44]  Foo Cheong Yit, Xueliang Song, Haizheng Song, Zhenrui Zhang, Masakazu Sugiyama, and Yoshiaki Nakano, "Four-bandgap energy monolithic integration in an SOA-MZI all-optical switch with selective area MOVPE", Technical Digest, Eighth International Symposium on Contemporary Photonics Technology (CPT 2005), E-2, pp. 57-58, Tokyo, January 12-14, 2005.

[45]  Hiromasa Shimizu and Yoshiaki Nakano, "14.7dB/mm TE mode nonreciprocal propagation in an InGaAsP/InP active waveguide optical isolator", Technical Digest (Post-deadline Papers), Conference on Optical Fiber Communication (OFC/NFOEC '05), PDP18, Anaheim, California, March 6-11, 2005.

[46]  Y. Shimogaki, T. Iino, M. Sugiyama, T. Momose, Y.S. Kim, T. Tsumura, Y. Kajikawa, S. Noda, and H. Komiyama, gThe initial nucleation behavior during Al, Cu, W-CVD on barrier metal layers,h Proceedings of Material Research Society 2004 Spring Meeting, F8.10, San Francisco, April 12-16, 2004 (2004).@

[47]  M. Sugiyama, T. Iino, T. Nakajima, T. Tanaka, Y. Egashira, K. Yamashita, H. Komiyama, and Y. Shimogaki, gTheoretical optimization of Al-CVD process based on elementary reaction simulation: from the growth rate to the surface morphology,h Abstract of the 3rd Asian Conference on Chemical Vapor Deposition, Taipei, Oct. 12-14, 2004, p.72 (2004).@

[48]  T. Momose, M. Sugiyama, and Y. Shimogaki, gIn situ observation of initial nucleation and growth processes in chemical vapor deposition and supercritical fluid deposition of copper,h Proc. Advanced Metallization Conference, Asia Session 2004 (ADMETA 2004), Tokyo, September 28-29, 2004, pp.106-107 (2004).@

[49]  Y. Shimogaki, M. Sugiyama, S. Noda, H. Komiyama, gInitial nucleation and growth in fabrication of metal thin films by chemical vapor deposition,h Abstract of The 10th Asian Pacific Confederation of Chemical Engineering (APCChE 2004), Kitakyushu, 3P-08-051 (2004).@

[50]  Y. Shimogaki, M. Sugiyama, Ik-Tae Im, Ho-Jin Oh, T. Tokimitsu, H. Watanabe, Y. Nakano, and H. Komiyama, gMulti-scale analysis for kinetic studies of chemical vapor deposition processes,h Abstract of The 10th Asian Pacific Confederation of Chemical Engineering (APCChE 2004), Kitakyushu, 3D-12 (2004).

[51]  H. Song, M. Sugiyama, X. Song, Y. Nakano, and Y. Shimogaki, gThe effect of substrate misorientation on GaAs selective area MOVPE,h Abstract of the 3rd Asian Conference on Chemical Vapor Deposition, Taipei, Oct. 12-14, 2004, p.64 (2004).@

 

’˜‘

Books

[52]  Connie J. Chang-Hasnain, Dexiu Huang, Yoshiaki Nakano, and Xiaomin Ren (Chairs/Editors), "Materials, active devices, and optical amplifiers (Proceedings of SPIE, Volume 5280)", The International Society for Optical Engineering (SPIE), Bellingham, WA, 2004.

 

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Review Papers

[53]  ’†–ì‹`º, "(µ‘Ò˜_•¶) ŒõƒƒCƒ„ƒŒƒX’ÊM—p”­ŒõEŽóŒõ‘fŽq (Invited Paper: Light emission and detection devices for optical wireless communications)", “ú–{ÔŠOüŠw‰ïŽ, vol. 13, no. 2, pp. 67-73, 2004”N4ŒŽ.

[54]  Yoshitada Katagiri, Hiroshi Fukuda, Hiroyuki Shinojima, Yoshiaki Nakano, Masashi Nakao, and Mitsuru Naganuma, "(Invited Paper) Nanometric mecha-photonics for innovative information and communications systems", Proceedings of SPIE, "Optomechatronic Micro/Nano Components, Devices, and Systems," vol. 5604, pp. 11-22, Philadelphia, Pennsylvania, October 27-28, 2004.

[55]  Yoshiaki Nakano, "(Invited Paper) Semiconductor integrated digital photonic devices", Meeting Abstracts, 206th Meeting of the Electro-Chemical Society, Symposium N1, Paper 1434, Oahu, Hawaii, October 3-8, 2004.

[56]  ’†–ì‹`º, "(µ‘Òu‰‰) ƒiƒmƒeƒNŒ¤‹†‚ÌV“®ŒüFƒfƒWƒ^ƒ‹ƒtƒHƒgƒjƒNƒX (Invited: New trend in nano-technology: digital photonics)", “dŽqî•ñ’ÊMŠw‰ïuŽŸ¢‘ãƒiƒm‹Zp‚ÉŠÖ‚·‚錤‹†ê–åˆÏˆõ‰ïv‘æ2‰ñŒ¤‹†‰ïu‰‰Ž‘—¿W, p. 35, 2004”N11ŒŽ25-26“ú.

 

ƒVƒ“ƒ|ƒWƒEƒ€EŒ¤‹†‰ïE‘å‰ï“™”­•\

Symposiums and Domestic Conferences

[57]  ˜aŸ†”Í–¾, ’†–ì‹M”V, Œà‹U, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_, "‰»‡•¨”¼“±‘Ì‚ÌMOVPE‘I‘𬒷‚É‚¨‚¯‚éˆÙí¬’·§Œä", ‰»ŠwHŠw‰ï‘æ69”N‰ï u‰‰—vŽ|W(XX‘åŠw), C306?, 2004”N3ŒŽ23-25?“ú.

[58]  ’†–ì‹M”V, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_, "ŽžŠÔ•Ï’²¬’·‚É‚æ‚éMOVPE•\–Ê”½‰žƒƒJƒjƒYƒ€‚̉ð–¾", ‰»ŠwHŠw‰ï‘æ69”N‰ï u‰‰—vŽ|W(XX‘åŠw), C306?, 2004”N3ŒŽ23-25?“ú.

[59]’|’†[, ƒ‚[ƒ‰EƒŒƒCƒoƒ“, ’†–ì‹`º, "‘½ƒ‚[ƒhŠ±ÂƒJƒvƒ‰Œ^‘oˆÀ’蔼“±‘̃Œ[ƒU‚ð—p‚¢‚½‘SŒõƒtƒŠƒbƒvEƒtƒƒbƒv“®ì (All optical flip-flop operation using a multimode interference bistable laser diode)", “dŽqî•ñ’ÊMŠw‰ï‘‡‘å‰ï(“Œ‹žH‹Æ‘åŠw)u‰‰˜_•¶W, C-4-30, p. 358, 2004”N3ŒŽ22-25“ú.

[60]VŒ©—²’j, ¬—ш葾˜Y, ’†–ì‹`º, •ЋËˉë, Œõ‰ª–õK, "‹à‘®Œõ“±”g˜H‚É‚¨‚¯‚éSPP-mode“`”À‘¹Ž¸‚Ì•]‰¿ (Evaluation of SPP-mode loss guided by metal optical waveguide)", “dŽqî•ñ’ÊMŠw‰ï‘‡‘å‰ï(“Œ‹žH‹Æ‘åŠw)u‰‰˜_•¶W, SC-5-5, p. S-71, 2004”N3ŒŽ22-25“ú.

[61]˜aŸ†”Í–¾, ’†–ì‹M”V, Œà‹U, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_, "‰»‡•¨”¼“±‘Ì‚ÌMOVPE‘I‘𬒷‚É‚¨‚¯‚éˆÙí¬’·§Œä (Abnormal growth control in MOVPE selective area growth of compound semiconductor)", ‘æ51‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(“Œ‹žH‰È‘åŠw), 28a-YG-7, 2004”N3ŒŽ28“ú.

[62]’†–ì‹M”V, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_, "MOVPE–@‚É‚¨‚¯‚錋»¬’·’†‚ł̕\–Ê”½‰žƒƒJƒjƒYƒ€‚̉ð–¾(2) (Investigation of surface reaction mechanism during crystal growth in MOVPE 2)", ‘æ51‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(“Œ‹žH‰È‘åŠw), 28p-YG-1, 2004”N3ŒŽ28“ú.

[63]‹àŽqT, ´…‘å‰ë, ’†–ì‹`º, "InGaAs/InAlAs MQW-EA•Ï’²Ší‚É‚¨‚¯‚éŒõ—U‹N‹üÜ—¦•ω»‚Ì‘ª’è (Photo-induced refractive index change in InGaAs/InAlAs MQW-EA modulators)", ‘æ51‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(“Œ‹žH‰È‘åŠw), 30p-ZV-1, 2004”N3ŒŽ30“ú.

[64]—›”J, C. ƒJƒ€ƒg[ƒ“ƒLƒbƒeƒBƒNƒ‹, ˜eˆê‘¾˜Y, ™ŽR³˜a, ‘šŠ_K_, ’†–ì‹`º, "‰–‘fŒnICPƒGƒbƒ`ƒ“ƒO‚É‚æ‚éGaN“±”g˜H‚Ìì» (Fabrication of GaN waveguides using Cl2-based inductively coupled plasma etching)", ‘æ51‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(“Œ‹žH‰È‘åŠw), 30a-ZV-7, 2004”N3ŒŽ30“ú.

[65]“Þ—Ç“cVˆê, ƒ_ƒ‹ƒWƒƒEƒWƒFƒbƒV[, ’”_, ’†–ì‹`º, "“d—¬‹·ó‘w‚ð‚à‚Á‚½ƒŠƒbƒWŒ^”¼“±‘̃Œ[ƒU‚ÌÅ“KÝŒvƒVƒ~ƒ…ƒŒ[ƒVƒ‡ƒ“ (Numerical optimization of ridge waveguide semiconductor lasers with current confinement structure)", ‘æ51‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(“Œ‹žH‰È‘åŠw), 31p-ZZ-2, 2004”N3ŒŽ31“ú.

[66]’|’†[, ƒ‚[ƒ‰EƒŒƒCƒoƒ“, ’†–ì‹`º, "•ûŒü«Œ‹‡ŠíŒ^”¼“±‘̃Œ[ƒU‚̬Œ^‰»‚É‚æ‚é‘SŒõƒtƒŠƒbƒvEƒtƒƒbƒv‚Ì“Á«‰ü‘P (Improvement of characteristics of all-optical flip-flop using a compact directionally-coupled bistable laser diode)", ‘æ51‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(“Œ‹žH‰È‘åŠw), 31a-ZK-9, 2004”N3ŒŽ31“ú.

[67]‘å’Ëß•¶, ’†–ì‹`º, "ƒ}ƒXƒgƒ‰ƒ“ƒXƒ|[ƒgInAsP—ÊŽq×ü‚̃oƒ“ƒh\‘¢‚ɑ΂·‚é‚Ђ¸‚݂̌ø‰Ê (Strain effect on the band structure of mass-transported InAsP quantum wires)", ‘æ51‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(“Œ‹žH‰È‘åŠw), 31a-ZZ-2, 2004”N3ŒŽ31“ú.

[68]’†–ì‹`º, "(µ‘Òu‰‰) “ú–{‚É‚¨‚¯‚éƒtƒHƒgƒjƒbƒNƒlƒbƒgƒ[ƒNƒfƒoƒCƒXŠJ”­", “dŽqî•ñ’ÊMŠw‰ïƒtƒHƒgƒjƒbƒNƒlƒbƒgƒ[ƒNEƒ[ƒNƒVƒ‡ƒbƒv, “Œ‹žH‹Æ‘åŠw, 2004”N4ŒŽ12“ú.

[69]Eric Gouardes and Yoshiaki Nakano, "Dependence of an optical burst switching node transparency on mux/demux arrayed waveguide grating (AWG”g’·‘½dE•ª—£‚É‚æ‚éŒõƒo[ƒXƒgƒXƒCƒbƒ`ƒ“ƒOƒm[ƒh‚Ì“§–¾«‚̕ω»)", “dŽqî•ñ’ÊMŠw‰ï‹ZpŒ¤‹†•ñ(ƒtƒHƒgƒjƒbƒNƒlƒbƒgƒ[ƒNŒ¤‹†‰ï), PN2004-48, pp. 81-85, 2004”N8ŒŽ20“ú.

[70]˜aŸ†”Í–¾, ’†–ì‹M”V, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_, "‰»‡•¨”¼“±‘Ì‚ÌMOVPE‘I‘𬒷‚É‚¨‚¯‚é•\–ÊŠgŽU‚Ì–ðŠ„ (Role of surface diffusion during selective area MOVPE growth of compound semiconductor)", ‘æ65‰ñ‰ž—p•¨—Šw‰ïŠwpu‰‰‰ï(“Œ–kŠw‰@‘åŠw), 1a-P1-28, 2004”N9ŒŽ1“ú.

[71]’†–ì‹M”V, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_, "MOVPE–@‚É‚¨‚¯‚錋»¬’·’†‚ł̕\–Ê”½‰žƒƒJƒjƒYƒ€‚̉ð–¾(3) (Investigation of surface reaction mechanism during crystal growth in MOVPE 3)", ‘æ65‰ñ‰ž—p•¨—Šw‰ïŠwpu‰‰‰ï(“Œ–kŠw‰@‘åŠw), 1a-P1-20, 2004”N9ŒŽ1“ú.

[72]ˆ¢”g—ÇŠî, r쑾˜Y, ˆäŽè’qË, ™ŽR³˜a, ´…‘å‰ë, ‘šŠ_K_, ’†–ì‹`º, ‰H˜HL•v, ‘½“c–M—Y, "GaN‚̃KƒXŒðŒÝ‹Ÿ‹‹ECR-RIE‚É‚¨‚¯‚éƒGƒbƒ`ƒ“ƒO‘¬“xEƒGƒbƒ`ƒ“ƒO–Ê•½’R«‚̉ü‘P (High etch rate and improved etched surface morphology in ECR -RIE of GaN by cyclic injection of etching gases)", ‘æ65‰ñ‰ž—p•¨—Šw‰ïŠwpu‰‰‰ï(“Œ–kŠw‰@‘åŠw), 1p-ZK-8, 2004”N9ŒŽ1“ú.

[73]‘vŠw—Ç, ’£äj, “ñŒû®Ž÷, ’†–ì‹`º, "MOVPE‘I‘𬒷‚É‚æ‚é‘SŒõƒXƒCƒbƒ`‚Ì“®“Á« (Dynamic switching performance of all-optical switches fabricated with selective-area MOVPE)", ‘æ65‰ñ‰ž—p•¨—Šw‰ïŠwpu‰‰‰ï(“Œ–kŠw‰@‘åŠw), 2a-ZM-8, 2004”N9ŒŽ2“ú.

[74]´…‘å‰ë, ’†–ì‹`º, "”ñ‘Š”½‘¹Ž¸‚ÉŠî‚­TEƒ‚[ƒh”¼“±‘Ì“±”g˜HŒ^ŒõƒAƒCƒ\ƒŒ[ƒ^‚̉ü—ÇŽŽì (Improved fabrication of a TE mode semiconductor-waveguide-type optical isolator based on the non-reciprocal loss shift)", ‘æ65‰ñ‰ž—p•¨—Šw‰ïŠwpu‰‰‰ï(“Œ–kŠw‰@‘åŠw), 2p-ZM-7, 2004”N9ŒŽ2“ú.

[75]Abdullah Al Amin, Kenji Sakurai, Takashi Sakurai, Masakazu Sugiyama, and Yoshiaki Nakano, "Fabrication of double-etched waveguides for compact and low-loss InP photonic circuits (ƒRƒ“ƒpƒNƒg‚Å’á‘¹Ž¸‚ÈInPŒõ‰ñ˜H‚Ì‚½‚ß‚Ì2‰ñƒGƒbƒ`“±”g˜H‚ÌŽŽì)", ‘æ65‰ñ‰ž—p•¨—Šw‰ïŠwpu‰‰‰ï(“Œ–kŠw‰@‘åŠw), 2a-ZM-7, 2004”N9ŒŽ2“ú.

[76]Chaiyasit Kumtornkittikul, Ning Li, Ichictaro Waki, Hiroshi Otani, Masakazu Sugiyama, and@ Yoshiaki Nakano, "GaN-based waveguide structure for ultrafast photonic devices utilizing intersubband absorption (GaNŒnƒTƒuƒoƒ“ƒhŠÔ‹zŽû’´‚‘¬ŒõƒfƒoƒCƒX‚ÉŒü‚¯‚½“±”g˜H‚ÌÝŒv)", “dŽqî•ñ’ÊMŠw‰ïƒGƒŒƒNƒgƒƒjƒNƒXƒ\ƒTƒCƒGƒeƒB‘å‰ï(“¿“‡‘åŠw)u‰‰˜_•¶W, C-4-17, p. 271, 2004”N9ŒŽ21“ú.

[77]´…‘å‰ë, ’†–ì‹`º, "”ñ‘Š”½‘¹Ž¸•ω»‚ÉŠî‚­TEƒ‚[ƒh”¼“±‘Ì“±”g˜HŒ^ŒõƒAƒCƒ\ƒŒ[ƒ^", ‘æ28‰ñ“ú–{‰ž—pŽ¥‹CŠw‰ïŠwpu‰‰ŠT—vW, 24aF-2, p. 516, ‰«“êƒRƒ“ƒxƒ“ƒVƒ‡ƒ“ƒZƒ“ƒ^[, 2004”N9ŒŽ21“ú`24“ú.

[78]ŸNˆäŒªŽi, Al Amin Abdullah, ŸNˆä‹MŽu, ™ŽR³˜a, ’†–ì‹`º, "InPŒnƒAƒŒƒC“±”g˜H‡•ª”gŠí‚ÌŽŽì‚ÆMOVPE‘I‘𬒷‚É‚æ‚é”\“®‘fŽqWω»‚ÌŒŸ“¢ (Fabrication of InP-based arrayed waveguide gratings and integration trial with active devices by MOVPE selective-area growth)", “dŽqî•ñ’ÊMŠw‰ï‹ZpŒ¤‹†•ñ(ƒtƒHƒgƒjƒbƒNƒlƒbƒgƒ[ƒNŒ¤‹†‰ï), PN2004-99, pp. 7-10, 2005”N1ŒŽ28“ú.

[79]‘vŠC­, ‘vŠw—Ç, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_, "‘I‘𬒷‚ð—p‚¢‚½•\–Ê”½‰ž‘¬“x‚̉ðÍ:GaAs MOCVD‚É‚¨‚¯‚鉷“xEŠî”–ʕûˆÊ‚ÌŒø‰Ê", ‰»ŠwHŠw‰ï‘æ70”N‰ï u‰‰—vŽ|W(–¼ŒÃ‰®‘åŠw), M302, 489, 2005”N3ŒŽ24“ú.

[80]’†–ì‹M”V, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_, "ŽžŠÔ•Ï’²¬’·‚É‚æ‚鉻‡•¨”¼“±‘ÌMOVPE–@‚Ì•\–Ê”½‰žƒƒJƒjƒYƒ€‰ðÍ", ‰»ŠwHŠw‰ï‘æ70”N‰ï u‰‰—vŽ|W(–¼ŒÃ‰®‘åŠw), M303, 494, 2005”N3ŒŽ24“ú.

[81]‰–“c—Ï–ç, ™ŽR³˜a, ‘šŠ_K_, ’†–ì‹`º, "InGaAsP‘I‘𬒷‚É‚¨‚¯‚é—ÊŽqˆäŒË”­Œõ”g’·‚Ì—\‘ª", ‰»ŠwHŠw‰ï‘æ70”N‰ï u‰‰—vŽ|W(–¼ŒÃ‰®‘åŠw), M301, 2005”N3ŒŽ24“ú.

[82]‘v ŠC­C‘v Šw—ÇC™ŽR³˜aC’†–ì‹`ºC‘šŠ_K_Ch‘I‘𬒷‚ð—p‚¢‚½•\–Ê”½‰ž‘¬“x‚̉ðÍ:GaAs MOCVD‚É‚¨‚¯‚鉷“xEŠî”–ʕûˆÊ‚ÌŒø‰ÊhC‰»ŠwHŠw‰ï‘æ70”N‰ï u‰‰—vŽ|W(–¼ŒÃ‰®‘åŠw), M302, 2005”N3ŒŽ24“ú.

[83]’†–ì‹M”VC™ŽR³˜aC’†–ì‹`ºC‘šŠ_K_ChŽžŠÔ•Ï’²¬’·‚É‚æ‚鉻‡•¨”¼“±‘ÌMOVPE–@‚Ì•\–Ê”½‰žƒƒJƒjƒYƒ€‰ðÍhC ‰»ŠwHŠw‰ï‘æ70”N‰ï u‰‰—vŽ|W(–¼ŒÃ‰®‘åŠw), M303, 2005”N3ŒŽ24“ú.

[84]”¿‘«‰p“ñC•½“c—m‰îC´…ò‰îC“¡] ½C™ŽR³˜aCK“c´ˆê˜YCh’´—ÕŠE…’†‚̌ő̗±ŽqŒQ‚ÌŽ_‰»”½‰ž‰ðÍhC‰»ŠwHŠw‰ï‘æ70”N‰ï u‰‰—vŽ|W(–¼ŒÃ‰®‘åŠw), C115, 2005”N3ŒŽ24“ú.

[85]•S£ Œ’C‘å‹v•Û’qOC™ŽR³˜aC‘šŠ_K_g’´—ÕŠECO2‚ð—p‚¢‚½Cu”––Œ‘ÍÏ:»–Œ‰ß’ö‚̉Ž‹‰»(2)hC‰»ŠwHŠw‰ï‘æ70”N‰ï u‰‰—vŽ|W(–¼ŒÃ‰®‘åŠw), A315, 2005”N3ŒŽ24“ú.

[86]Έä’B–çC•S£ Œ’C™ŽR³˜aC‘šŠ_K_Cg’´—ÕŠECO2‚ð—p‚¢‚½Ta‰»‡•¨”––ŒŒ`¬hC ‰»ŠwHŠw‰ï‘æ70”N‰ï u‰‰—vŽ|W(–¼ŒÃ‰®‘åŠw), A316, 2005”N3ŒŽ24“ú.

[87]ŸNˆäŒªŽi, ƒAƒ‹ƒAƒ~ƒ“ ƒAƒuƒhƒDƒbƒ‰[, ‰–“c—Ï–ç, ™ŽR³˜a, ’†–ì‹`º, "‘I‘𬒷‚É‚æ‚éŒõ‡•ª”gŠí‚Æ”¼“±‘ÌŒõ‘•Ší‚ÌWω» (Selective area grown semiconductor optical amplifier integrated demultiplexer)", “dŽqî•ñ’ÊMŠw‰ï‘‡‘å‰ï(‘åã‘åŠw)u‰‰˜_•¶W, C-3-19, p. 189, 2005”N3ŒŽ21“ú.

[88]Lˆä“T—Ç, ‰’•”’‰, ’|’†[, “¡“c”Ž”V, ’†–ì‹`º, "ŒõIC—p‚–§“xƒsƒbƒ`•ÏŠ·Œõƒtƒ@ƒCƒoƒAƒŒƒC"OPLEAF"‚ÌŠJ”­ (Development of "OPLEAF", pitch-conversion dense fiber array for photonic integrated circuits)", “dŽqî•ñ’ÊMŠw‰ï‘‡‘å‰ï(‘åã‘åŠw)u‰‰˜_•¶W, C-3-30, p. 200, 2005”N3ŒŽ22“ú.

[89]Lˆä“T—Ç, ‰’•”’‰, “¡“c”Ž”V, ’|’†[, ’†–ì‹`º, "ŒõIC—p‚–§“xƒsƒbƒ`•ÏŠ·Œõƒtƒ@ƒCƒoƒAƒŒƒC‚ÌŠJ”­ (Development of pitch conversion optical fiber array for connecting optical IC and fibers)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 29a-ZR-8, 2005”N3ŒŽ29“ú.

[90]´…‘å‰ë, ’†–ì‹`º, "”¼“±‘Ì^‹­Ž¥«‹à‘®ƒnƒCƒuƒŠƒbƒh‚É‚æ‚éŒõ’ÊM”g’·‘Ñ“±”g˜HŒ^ŒõƒAƒCƒ\ƒŒ[ƒ^(Waveguide optical isolator using semiconductor/ferromagnet hybrid structure for optical telecommunication)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 30p-YD-8, 2005”N3ŒŽ30“ú.

[91]’|’†[, ƒ‚[ƒ‰EƒŒƒCƒoƒ“, ’†–ì‹`º, "‘½ƒ‚[ƒhŠ±ÂƒJƒvƒ‰Œ^‘oˆÀ’背[ƒU‚¨‚æ‚Ñ”¼“±‘ÌŒõ‘•Ší‚ð—p‚¢‚½M†Ä¶”g’·•ÏŠ·Ší‚ÌŒŸ“¢ (Regenerative wavelength conversion using multimode interference bistable laser diodes with semiconductor optical amplifiers)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 31p-ZQ-7, 2005”N3ŒŽ31“ú.

[92]´…‘å‰ë, ’†–ì‹`º, "InGaAsP/InP”¼“±‘ÌŒõ‘•Ší“±”g˜H‚É‚¨‚¯‚éTEƒ‚[ƒh”ñ‘Š”½‘¹Ž¸Œ»Û‚̉‚ÌŽÀØ (First demonstration of TE mode nonreciprocal propagation in an InGaAsP/InP active waveguide)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 31a-ZQ-10, 2005”N3ŒŽ31“ú.

[93]ƒCƒbƒgƒt[ƒ`ƒ‡ƒ“, ‘vŠw—Ç, ’£äj, ‘vŠC­, ™ŽR³˜a, ’†–ì ‹`º, "ƒ}ƒbƒnEƒcƒFƒ“ƒ_Œ^SOA‘SŒõƒXƒCƒbƒ`‚É‚¨‚¯‚é4ƒoƒ“ƒhƒMƒƒƒbƒvƒ‚ƒmƒŠƒVƒbƒNWÏ (Four-Bandgap Energy Monolithic Integration in an SOA-MZI All-Optical Switch)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 31p-ZQ-10, 2005”N3ŒŽ31“ú.

[94]‘vŠw—Ç, ƒCƒbƒgƒt[ƒ`ƒ‡ƒ“, ’£äj, ‘vŠC­, ™ŽR³˜a, ’†–ì ‹`º, "MOVPE‘I‘𬒷‚É‚æ‚é‘SŒõƒXƒCƒbƒ`‚ÌOTDM DEMUX“®ì (OTDM demultiplexing with all-optical switches fabricated by selective-area MOVPE)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 31p-ZQ-9, 2005”N3ŒŽ31“ú.

[95]‰–“c—Ï–ç, ƒAƒ‹ƒAƒ~ƒ“ ƒAƒuƒhƒDƒ‰[, ™ŽR³˜a, ‘šŠ_K_, ’†–ì‹`º, "MOVPE‘I‘𬒷‚̃‚ƒfƒŠƒ“ƒO‚ð—p‚¢‚½InGaAsP/InPŒn‘I‘𬒷‚Ì“Á«—\‘ª (Predictive modeling of the properties of InGaAsP/InP grown by selective area metal-organic vapor phase epitaxy)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 31a-ZM-4, 2005”N3ŒŽ31“ú.

[96]‰J‹{’qG, ´…‘å‰ë, ’†–ì‹`º, "TMƒ‚[ƒh”ñ‘Š”½“`”À‘¹Ž¸“±”g˜H‚Ì컂ƎÀØ (Fabrication and demonstration of a TM mode nonreciprocal propagation loss waveguide)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 31a-ZQ-11, 2005”N3ŒŽ31“ú.

[97]‘å’J—m, ƒ`ƒƒƒCƒ„ƒXƒBƒbƒgƒJƒ€ƒgƒD[ƒ“ƒLƒeƒBƒbƒNƒ‹, ™ŽR³˜a, ’†–ì‹`º, "MOVPE¬’·GaN/AlN‘½d—ÊŽqˆäŒË’†‚̃Tƒuƒoƒ“ƒhŠÔ‘JˆÚ‚ÉŠñ—^‚·‚é“dŽq–§“x‚Ì•]‰¿ (Estimation of carrier density contributing to intersuband transition in AlN/GaN MQWs grown by MOVPE)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 31p-L-2, 2005”N3ŒŽ31“ú.

[98]‘vŠC­, ‘vŠw—Ç, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_, "MOVPE GaAs‘I‘𬒷‚Ì•\–Ê”½‰ž‚É‚¨‚¯‚éŠî”ÂoffŠp‚̉e‹¿ (The influence of substrate misorientation on surface reaction kinetics of GaAs selective area MOVPE)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 31a-ZM-3, 2005”N3ŒŽ31“ú.

[99]’†–ì‹M”V, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_, "MOVPE–@‚É‚¨‚¯‚錋»¬’·’†‚ł̕\–Ê”½‰žƒƒJƒjƒYƒ€‚̉ð–¾(4) (Investigation of surface reaction mechanism during crystal growth in MOVPE 4)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 1a-ZM-1, 2005”N4ŒŽ1“ú.

[100]         ’£äj, ‘vŠw—Ç, ƒCƒbƒgƒt[ƒ`ƒ‡ƒ“, ’|’†[, ™ŽR³˜a, ’†–ì ‹`º, "GRIN-SCH\‘¢‚É‚æ‚éMOVPE‘I‘𬒷Œõ“±”g˜H‚Ì“à•”‘¹Ž¸’ጸ (Internal loss reduction by GRIN-SCH structure in optical waveguides prepared using MOVPE selective area growth)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 1p-ZQ-4, 2005”N4ŒŽ1“ú.

 

‚»‚Ì‘¼

Others

[101]           Yoshiaki Nakano, Masakazu Sugiyama, Hiromasa Shimizu, Eric Gouardes, Mitsuru Takenaka, Maura Raburn, Jesse Darja, Foocheong Yit, and Xiaoping Zhou, "Semiconductor photonic networking devices Ðresearch toward digital photonics", Proceedings of International Symposium on Electronics for Future Generations, pp. 437-442, Tokyo, March 10-11, 2004.

[102]           Masakazu Sugiyama, Yoshiaki Nakano, Yukihiro Shimogaki, Ichitaro Waki, Ho-Jin Oh, Xueliang Song, Abdullah Al Amin, Takafumi Ohtsuka, Takayuki Nakano, and Chaiyasit Kumtornkittikul, "Advanced metalorganic vapor phase epitaxy technology for monolithic integration of photonic devices", Proceedings of International Symposium on Electronics for Future Generations, pp. 151-155, Tokyo, March 10-11, 2004.

[103]           ’†–ì‹`º, "2004”NŒõƒtƒ@ƒCƒo[’ÊM‰ï‹c(OFC2004)‚ÌŠT—v", ƒIƒvƒgƒƒjƒNƒX, vol. 23, no. 5, pp. 110-112, 2004”N5ŒŽ10“ú.

[104]           ’†–ì‹`º, ’|’†[, "ƒŠƒ|[ƒg‘Û‰ï‹c OFC2004 (ƒfƒoƒCƒX)", ŒõŽY‹Æ‹ZpU‹»‹¦‰ï Opto News (ƒIƒvƒgƒjƒ…[ƒY), no.4 (’ÊŠª142), pp. 38-39, 2004”N7ŒŽ1“ú.

[105]           Xueliang Song, Foo Cheong Yit, Zhenrui Zhang, Masakazu Sugiyama, and Yoshiaki Nakano, "SOA-integrated MZI all-optical switches fabricated by selective area MOVPE", Abstracts of the 2004 JST CREST Symposium on Functional Evolution of Materials and Devices Based on Electron/Photon Related Phenomena (FEMD), p. 65, Tokyo, September 29-30, 2004.

[106]           Hiromasa Shimizu, Tomohiro Amemiya, Yoshiaki Nakano, and Masaaki Tanaka, "Fabrication of a TE mode semiconductor waveguide-type optical isolator based on nonreciprocal loss", Abstracts of the 2004 JST CREST Symposium on Functional Evolution of Materials and Devices Based on Electron/Photon Related Phenomena (FEMD), p. 64, Tokyo, September 29-30, 2004.

[107]           Chaiyasit Kumturnkittikul, Hiroshi Otani, Yukihiro Shimogaki, Masakazu Sugiyama, and Yoshiaki Nakano, "MOVPE growth of GaN/AlN multiple quantum wells and waveguide fabrication for ultrafast photonic devices", Abstracts of the 2004 JST CREST Symposium on Functional Evolution of Materials and Devices Based on Electron/Photon Related Phenomena (FEMD), p. 63, Tokyo, September 29-30, 2004.

[108]           Yoshiaki Nakano, "Innovative photon-controlling devices based on artificial optical properties of semiconductors -exploration towards digital photonics", Abstracts of the 2004 JST CREST Symposium on Functional Evolution of Materials and Devices Based on Electron/Photon Related Phenomena (FEMD), pp. 56-59, Tokyo, September 29-30, 2004.

[109]           ’†–ì‹`º, "Åæ’[ƒvƒƒZƒX‹Zp‚Å‘n‚锼“±‘ÌŒõƒfƒoƒCƒXWωñ˜H", æ’[’m‹@”\Þ—¿ƒfƒoƒCƒXƒ‰ƒ{ƒ‰ƒgƒŠ[ƒYÝ—§‹L”OƒtƒH[ƒ‰ƒ€. 2004”N11ŒŽ5“ú.

[110]           ’†–ì‹`º, "ƒfƒWƒ^ƒ‹ƒtƒHƒgƒjƒNƒX‚ÉŒü‚¯‚½”¼“±‘ÌŒõƒfƒoƒCƒXEŒõWωñ˜H", ŽYŠwН˜AŒgƒrƒWƒlƒXŒð—¬‰ï, Šwp‘‡ƒZƒ“ƒ^[, 2004”N12ŒŽ6“ú.

[111]           Abdullah Al Amin, "WDMƒTƒuƒVƒXƒeƒ€‚Ì”¼“±‘̃‚ƒmƒŠƒVƒbƒNWω»‚ÉŠÖ‚·‚錤‹† (Research on monolithic integration of WDM subsystem on InP)", “Œ‹ž‘åŠw ŒÅ‘̃GƒŒƒNƒgƒƒjƒNƒXEƒIƒvƒgƒGƒŒƒNƒgƒƒjƒNƒXŒ¤‹†”­•\‰ïu‰‰Ž‘—¿W, pp. 89-96, 2005”N2ŒŽ28“ú.

[112]           ‘å’Ëß•¶, "•ª•z‹AŠÒŒ^ƒŒ[ƒU[ƒ_ƒCƒI[ƒh‚ÌŠˆ«‰ñÜŠiŽq‚ÉŒü‚¯‚½ƒ}ƒXƒgƒ‰ƒ“ƒXƒ|[ƒgInAsP—ÊŽq×ü‚ÉŠÖ‚·‚錤‹† (Study on mass-transported InAsP quantum wire for the active grating of the distributed feedback laser diodes)", “Œ‹ž‘åŠw ŒÅ‘̃GƒŒƒNƒgƒƒjƒNƒXEƒIƒvƒgƒGƒŒƒNƒgƒƒjƒNƒXŒ¤‹†”­•\‰ïu‰‰Ž‘—¿W, pp. 81-88, 2005”N2ŒŽ28“ú.