˜_•¶E’˜‘ˆê——i2004”N“xj
Publications List
(2004)
Œ¤‹†˜_•¶
Journal Papers
[1]
Kazumasa
Sakurai, Hideki Yokoi, Tetsuya Mizumoto, Daisuke Miyashita, and Yoshiaki
Nakano, "Fabrication of semiconductor laser for integration with optical
isolator", Japanese Journal of Applied Physics, vol. 43, no. 4A, pp.
1388-1392, April 2004.
[2]
Ning Li,
Ichitaro Waki, Chaiyasit Kumtornkittikul, Ji-Hao Liang, Masakazu Sugiyama,
Yukihiro Shimogaki, and Yoshiaki Nakano, "Fabrication of AlGaN-based
waveguides by inductively coupled plasma etching", Japanese Journal of
Applied Physics, vol. 43, no. 10B, pp. L1340-L1342, September 24, 2004.
[3]
—À‹gèM, ù‘qŒ«, ’†–ì‹`º, "‚‘¬ŒõƒƒCƒ„ƒŒƒX’ÊM—p”ŒõƒfƒoƒCƒX
(High-speed light emitting diodes for optical wireless communications)", ŒõŠw, vol. 33, no. 10, pp. 601-603, 2004”N10ŒŽ.
[4]
Katsumasa
Horiguchi, Yoshitada Katagiri, Yoshiaki Nakano, Ikutaro Kobayashi, and Yasuyuki
Mitsuoka, "Theoretical consideration of surface-plasmon polaritons based
on dynamics of electric dipoles formed on metal surfaces", Proceedings of
SPIE, "Optomechatronic Micro/Nano Components, Devices, and Systems,"
vol. 5604, pp. 185-194, Philadelphia, Pennsylvania, October 27-28, 2004.
[5]
Tadashi Suga,
Takao Niimi, Ikutaro Kobayashi, Yoshitada Katagiri, Yoshiaki Nakano, and
Yasuyuki Mitsuoka, "Investigation of splitting SPP modes propagating at
metal-dielectric interface", Proceedings of SPIE, "Optomechatronic
Micro/Nano Components, Devices, and Systems," vol. 5604, pp. 173-184,
Philadelphia, Pennsylvania, October 27-28, 2004.
[6]
Hiromasa
Shimizu and Yoshiaki Nakano, "First demonstration of TE mode nonreciprocal
propagation in an InGaAsP/InP active waveguide for an integratable optical
isolator", Japanese Journal of Applied Physics, vol. 43, no. 12A, pt. 2
(Express Letter), pp. L1561-L1563, November 12, 2004.
[7]
S. Inasawa, M.
Sugiyama and Y. Yamaguchi, gLaser-Induced Shape Transformation of Gold
Nanoparticles below the Melting Point: The Effect of Surface Melting,h J. Phys.
Chem. B 109, pp. 3104-3111
(2004).@
[8]
T. Nakano, M.
Sugiyama, Y. Nakano and Y. Shimogaki:
The Role of the Surface Adsorption Layer during MOVPE Growth Analyzed by the
Flow Modulation Method, J. Crystal Growth, 472, pp. 15-23 (2004).@
[9]
R. Shimizu, M.
Ogino, M. Sugiyama and Y. Shimogaki, gAnalysis and modeling of low pressure
chemical vapor deposition of phosphorus-doped polysilicon in commercial scale
reactor,h J. Vac. Sci. Technol. A22, pp. 1763-1766 (2004).@
[10]
M. Sugiyama,
S. Tagawa, H. Ohmura and S. Koda, gSupercritical water oxidation of a carbon
particle by Schlieren photography,h AIChE. J., 50, pp. 2082-2089 (2004).@
[11]
A. Morita, M.
Sugiyama, H. Kameda, D. R. Hanson and S. Koda, gMass accommodation coefficient
of water: Molecular dynamics simulation and revised analysis of droplet
train/flow reactor experiment,h J. Phys. Chem. B 108, pp. 9111-9120 (2004).@
[12]
T. Hirose, T.
Omatsu, M. Sugiyama, S. Inasawa and S. Koda, gAu-nano-particles production by
pico-second ultra-violet laser deposition in Au-ion doped PMMA film,h Chem.
Phys. Lett. 390, pp. 166-169 (2004).@
[13]
D. R. Hanson,
M. Sugiyama, A. Morita, gRevised Kinetics in the Droplet-Train Apparatus Due to
a Wall Loss,h J. Phys. Chem. A, 108, 3739-3744 (2004).@
[14]
M. Sugiyama,
M. Kataoka, H. Ohmura, H. Fujiwara and S. Koda, gOxidation of carbon particles
in supercritical water: rate and mechanism,h Ind. Eng. Chem. Res., 43, pp. 690-699 (2004).@
[15]
M. Sugiyama,
H. J. Oh, Y. Nakano and Y. Shimogaki, gPolycrystals growth on dielectric masks
during InP/GaAs selective MOVPE,h J. Crystal Growth, 261 pp. 411-418 (2004).
[16]
H. J. Oh, M.
Sugiyama, Y. Nakano and Y. Shimogaki, gThe effect of group V precursor on
selective area MOVPE of InP/GaAs-related materials,h J. Crystal Growth, 261 (2-3) pp. 419-426 (2004).
[17]
I. T. Im, H.
J. Oh, M. Sugiyama, Y. Nakano and Y. Shimogaki, gFundamental kinetics
determining growth rate profiles of In and GaAs in MOCVD with horizontal
reactor,h J. Crystal Growth, 261 (2-3) pp. 214-224 (2004).@
‘Û‰ï‹c˜_•¶
International Conferences
[18]
Masakazu
Sugiyama, Ho-Jin Oh, Ik-Tae Im, Yoshiaki Nakano, and Yukihiro Shimogaki,
"Measurement of surface reaction rate constants and reactor-scale
simulation of growth rate and composition in InGaAsP MOVPE", Workbook,
12th International Conference on Metal-Organic Vapor Phase Epitaxy, p. 29,
Maui, Hawaii, May 30-June 4, 2004.
[19]
Takayuki
Nakano, Masakazu Sugiyama, Yoshiaki Nakano, and Yukihiro Shimogaki, "The
role of the surface adsorption layer during InGaAsP MOVPE growth analyzed by
the flow modulation method", Workbook, 12th International Conference on
Metal-Organic Vapor Phase Epitaxy,@ p.
9, Maui, Hawaii, May 30-June 4, 2004.
[20]
Takafumi
Ohtsuka and Yoshiaki Nakano, "Strain distribution and band structure of
mass-transported InAsP quantum wires buried in InGaAsP/InP", Conference
Proceedings, 16th International Conference on Indium Phosphide and Related
Materials (IPRM '04), P1-35, pp. 253-256, Kagoshima, Japan, May 31-June 4,
2004.
[21]
Mitsuru
Takenaka, Maura Raburn, and Yoshiaki Nakano, "Improvement of optical
flip-flop characteristics of compact directionally-coupled bistable laser
diode", Conference Proceedings, 16th International Conference on Indium
Phosphide and Related Materials (IPRM '04), WA3-4, pp. 523-526, Kagoshima, Japan,
May 31-June 4, 2004.
[22]
Abdullah Al
Amin, Xueliang Song, Kenji Sakurai,@
Masakazu Sugiyama, and Yoshiaki Nakano, "Integration of
semiconductor optical amplifiers@ with
an arrayed waveguide grating@
demultiplexer by MOVPE selective area growth", Technical Digest,
Topical Meeting on Integrated Photonics Research (IPR 2004), IFB4, San
Francisco, California, June 30-July 2, 2004.
[23]
Yoshiki Awa,
Tomoyoshi Ide, Taro Arakawa, Nobuo Haneji, Kunio Tada, Masakazu Sugiyama,
Hiromasa Shimizu, Yukihiro Shimogaki, and Yoshiaki Nakano, "High etch rate
and improved etched surface morphology@
in electron cyclotron resonance-reactive ion etching of GaN@ by cyclic injection of CH4/H2/Ar and O2 with
constant Ar flow", Extended Abstracts of the 23rd Electronic Materials
Symposium, C7, pp. 45-48, Izu-Nagaoka, Shizuoka, July 7-9, 2004.
[24]
Noriaki Waki,
Takayuki Nakano, Ho-jin Oh, Masakazu Sugiyama, Yoshiaki Nakano, and Yukihiro
Shimogaki, "Understanding the abnormal growth of InP-related materials in
selective-area MOVPE", Extended Abstracts of the 23rd Electronic Materials
Symposium, D5, pp. 69-72, Izu-Nagaoka, Shizuoka, July 7-9, 2004.
[25]
Takayuki
Nakano, Masakazu Sugiyama, Yoshiaki Nakano, Yukihiro Shimogaki,
"Examination of sub-surface in MOVPE by time modulation growth",
Extended Abstracts of the 23rd Electronic Materials Symposium, D8, pp. 79-82,
Izu-Nagaoka, Shizuoka, July 7-9, 2004.
[26]
Shin Kaneko,
Hiromasa Shimizu, Xiaoping Zhou, and Yoshiaki Nakano, "Photo-induced phase
modulation in InGaAs/InGaAlAs electro-absorption modulators for all-optical
wavelength conversion", Technical Digest, the Ninth Optoelectronics and
Communications Conference (OECC 2004), 14F1-5, pp. 550-551, Yokohama, July
12-16, 2004.
[27]
Eric Gouardes
and Yoshiaki Nakano, "Mux/demux filter concatenation in an all-optical
burst switching (OBS) node", Technical Digest, the Ninth Optoelectronics
and Communications Conference (OECC 2004), 15A2-3, pp. 590-591, Yokohama, July
12-16, 2004.
[28]
Hiromasa
Shimizu and Yoshiaki Nakano, "Fabrication of a
semiconductor-waveguide-type optical isolator based on the nonreciprocal loss
shift", Abstract Book of the Third International Conference on Physics and
Applications of Spin-Related Phenomena in Semiconductors (PASPS III), Paper
128, pp. 137-138, Santa Barbara, California, July 21-23, 2004.
[29]
Mitsuru
Takenaka, Maura Raburn, and Yoshiaki Nakano, "(Invited Paper) Simulation
of semiconductor all-optical flip-flops using the finite-difference
beam-propagation method", Proceedings of the 4th International Conference
on Numerical Simulation of Optoelectronic Devices (NUSOD 2004), TuC1, pp.
15-18, Santa Barbara, California, August 24-26, 2004.
[30]
Abdullah Al
Amin, Takeshi Doi, Kenji Sakurai, Zhenrui Zhang, Xueliang Song, Masakazu
Sugiyama, and@ Yoshiaki Nakano,
"Simulation of bandgap in MOVPE selective area growth of InGaAsP-based
photonic integrated circuits", Proceedings of the 4th International
Conference on Numerical Simulation of Optoelectronic Devices (NUSOD 2004),
TuC5, pp. 25-26, Santa Barbara, California, August 24-26, 2004.
[31]
Maura Raburn,
Mitsuru Takenaka, and Yoshiaki Nakano, "Simulation of distributed Bragg
reflector multi-mode interference bistable laser diodes for cascadable
all-optical flip-flops", Proceedings of the 4th International Conference
on Numerical Simulation of Optoelectronic Devices (NUSOD 2004), TuC3, pp.
21-22, Santa Barbara, California, August 24-26, 2004.
[32]
Xueliang Song,
Zhenrui Zhang, and Yoshiaki Nakano, "Monolithically integrated SOA-MZI
all-optical switch with high-yield regrowth-free selective area MOVPE",
Technical Digest, 30th European Conference on Optical Communication (ECOC
2004), Mo3.4.5, pp. 34-35, Stockholm, Sweden, September 5-9, 2004.
[33]
Mitsuru
Takenaka, Maura Raburn, and Yoshiaki Nakano, "All-optical flip-flop
operation via two-mode bistability of multimode interference bistable laser
diodes", Technical Digest, 30th European Conference on Optical
Communication (ECOC 2004), Tu4.4.5, pp. 254-255, Stockholm, Sweden, September
5-9, 2004.
[34]
Mitsuru
Takenaka, Maura Raburn, and Yoshiaki Nakano, "All-optical flip-flop
multimode interference bistable laser diodes with reverse biased saturable
absorbers", Conference Digest, 19th IEEE International Semiconductor Laser
Conference, WC4, pp. 26-27, Matsue, Shimane, September 22-25, 2004.
[35]
Hiromasa
Shimizu and Yoshiaki Nakano, "First demonstration of TE mode nonreciprocal
propagation in a semiconductor active waveguide for an integratable optical
isolator", Conference Digest (Post Deadline Papers), 19th IEEE
International Semiconductor Laser Conference, SaB1, pp. 1-2, Matsue, Shimane, September
22-25, 2004.
[36]
Ning Li,
Ichitaro Waki, Masakazu Sugiyama, Yukihiro Shimogaki, and Yoshiaki Nakano,
"Fabrication of group III-nitride waveguides by inductively coupled plasma
etching", Meeting Abstracts, 206th Meeting of the Electro-Chemical Society,
M1, Paper 1237, Oahu, Hawaii, October 3-8, 2004.
[38]
Yoshiki Awa,
Tomoyoshi Ide, Taro Arakawa, Nobuo Haneji, Kunio Tada, Masakazu Sugiyama,
Hiromasa Shimizu, Yukihiro Shimogaki, and Yoshiaki Nakano, "Electron
cyclotron resonance reactive ion etching of GaN by cyclic injection of
CH4/H2/Ar and O2 with constant Ar flow for high etch rate and improvement of
etched surface morphology", Digest of Papers, International Microprocesses
and Nanotechnology Conference (MNC 2004), 28P-7-22, Osaka, Japan, October
26-29, 2004.
[39]
Tomonari
Shioda, Takeshi Doi, Abdullah Al Amin, Xue-Liang Song, Masakazu Sugiyama,
Yukihiro Shimogaki, and Yoshiaki Nakano, "Simulation and design of the
emission wavelength of multiple quantum well structures fabricated by selective
area metal-organic vapor phase epitaxy", Abstract of the 3rd Asian
Conference on Chemical Vapor Deposition, Taipei, Oct. 12-14, 2004, p. 63 (2004).
[40]
Noriaki Waki,
Takayuki Nakano, Masakazu Sugiyama, Yoshiaki Nakano, and Yukihiro Shimogaki,
"Role of surface diffusion during selective area MOVPE growth of compound
semiconductor", Abstract of the 3rd Asian Conference on Chemical Vapor
Deposition, Taipei, Oct. 12-14, 2004, p. 51 (2004).
[41]
Chaiyasit
Kumtornkittikul, Ichitaro Waki, Ning Li, Masakazu Sugiyama,@ Yukihiro Shimogaki, and Yoshiaki Nakano,
"GaN/AlN multiple quantum wells and waveguide fabrication for ultrafast
photonic devices utilizing intersubband transition", Conference
Proceedings, IEEE Region 10 Conference (TENCON 2004), TD-10-2,0899,@ pp. 140-143, Chiang Mai, Thailand, November
21-24, 2004.
[42]
Hiromasa
Shimizu and Yoshiaki Nakano, "Fabrication of a TE mode
semiconductor-waveguide-type optical isolator based on the@ nonreciprocal loss shift", Abstracts,
MRS Fall Meeting, J4.7, p. 276, Boston, Massachusetts, November 29-December 3,
2004.
[43]
Xueliang Song,
Foo Cheong Yit, Zhenrui Zhang, and Yoshiaki Nakano, "Monolithic MZI
all-optical switch with selective area MOVPE", Abstract Book, 2004
Conference on Optoelectronic and Microelectronic Materials and Devices (COMMAD
04), T6-1, p. 99, Brisbane, Australia, December 8-10, 2004.
[44]
Foo Cheong
Yit, Xueliang Song, Haizheng Song, Zhenrui Zhang, Masakazu Sugiyama, and
Yoshiaki Nakano, "Four-bandgap energy monolithic integration in an SOA-MZI
all-optical switch with selective area MOVPE", Technical Digest, Eighth
International Symposium on Contemporary Photonics Technology (CPT 2005), E-2,
pp. 57-58, Tokyo, January 12-14, 2005.
[45]
Hiromasa
Shimizu and Yoshiaki Nakano, "14.7dB/mm TE mode nonreciprocal propagation
in an InGaAsP/InP active waveguide optical isolator", Technical Digest
(Post-deadline Papers), Conference on Optical Fiber Communication (OFC/NFOEC
'05), PDP18, Anaheim, California, March 6-11, 2005.
[46]
Y. Shimogaki,
T. Iino, M. Sugiyama, T. Momose, Y.S. Kim, T. Tsumura, Y. Kajikawa, S. Noda,
and H. Komiyama, gThe initial nucleation behavior during Al, Cu, W-CVD on
barrier metal layers,h Proceedings of Material Research Society 2004 Spring
Meeting, F8.10, San Francisco, April 12-16, 2004 (2004).@
[47]
M. Sugiyama,
T. Iino, T. Nakajima, T. Tanaka, Y. Egashira, K. Yamashita, H. Komiyama, and Y.
Shimogaki, gTheoretical optimization of Al-CVD process based on elementary
reaction simulation: from the growth rate to the surface morphology,h Abstract
of the 3rd Asian Conference on Chemical Vapor Deposition, Taipei, Oct. 12-14,
2004, p.72 (2004).@
[48]
T. Momose, M.
Sugiyama, and Y. Shimogaki, gIn situ observation of initial nucleation and
growth processes in chemical vapor deposition and supercritical fluid
deposition of copper,h Proc. Advanced Metallization Conference, Asia Session
2004 (ADMETA 2004), Tokyo, September 28-29, 2004, pp.106-107 (2004).@
[49]
Y. Shimogaki,
M. Sugiyama, S. Noda, H. Komiyama, gInitial nucleation and growth in
fabrication of metal thin films by chemical vapor deposition,h Abstract of The
10th Asian Pacific Confederation of Chemical Engineering (APCChE 2004), Kitakyushu,
3P-08-051 (2004).@
[50]
Y. Shimogaki,
M. Sugiyama, Ik-Tae Im, Ho-Jin Oh, T. Tokimitsu, H. Watanabe, Y. Nakano, and H.
Komiyama, gMulti-scale analysis for kinetic studies of chemical vapor
deposition processes,h Abstract of The 10th Asian Pacific Confederation of
Chemical Engineering (APCChE 2004), Kitakyushu, 3D-12 (2004).
[51]
H. Song, M.
Sugiyama, X. Song, Y. Nakano, and Y. Shimogaki, gThe effect of substrate
misorientation on GaAs selective area MOVPE,h Abstract of the 3rd Asian
Conference on Chemical Vapor Deposition, Taipei, Oct. 12-14, 2004, p.64
(2004).@
’˜‘
Books
[52]
Connie J.
Chang-Hasnain, Dexiu Huang, Yoshiaki Nakano, and Xiaomin Ren (Chairs/Editors),
"Materials, active devices, and optical amplifiers (Proceedings of SPIE,
Volume 5280)", The International Society for Optical Engineering (SPIE),
Bellingham, WA, 2004.
‘àE‰ðà˜_•¶
Review Papers
[53]
’†–ì‹`º, "(µ‘Ò˜_•¶) ŒõƒƒCƒ„ƒŒƒX’ÊM—p”ŒõEŽóŒõ‘fŽq (Invited Paper: Light emission and
detection devices for optical wireless communications)", “ú–{ÔŠOüŠw‰ïŽ, vol. 13, no. 2, pp. 67-73, 2004”N4ŒŽ.
[54]
Yoshitada
Katagiri, Hiroshi Fukuda, Hiroyuki Shinojima, Yoshiaki Nakano, Masashi Nakao,
and Mitsuru Naganuma, "(Invited Paper) Nanometric mecha-photonics for
innovative information and communications systems", Proceedings of SPIE,
"Optomechatronic Micro/Nano Components, Devices, and Systems," vol.
5604, pp. 11-22, Philadelphia, Pennsylvania, October 27-28, 2004.
[55]
Yoshiaki
Nakano, "(Invited Paper) Semiconductor integrated digital photonic
devices", Meeting Abstracts, 206th Meeting of the Electro-Chemical
Society, Symposium N1, Paper 1434, Oahu, Hawaii, October 3-8, 2004.
[56]
’†–ì‹`º, "(µ‘Òu‰‰) ƒiƒmƒeƒNŒ¤‹†‚ÌV“®ŒüFƒfƒWƒ^ƒ‹ƒtƒHƒgƒjƒNƒX (Invited: New trend in nano-technology:
digital photonics)", “dŽqî•ñ’ÊMŠw‰ïuŽŸ¢‘ãƒiƒm‹Zp‚ÉŠÖ‚·‚錤‹†ê–åˆÏˆõ‰ïv‘æ2‰ñŒ¤‹†‰ïu‰‰Ž‘—¿W,
p. 35, 2004”N11ŒŽ25-26“ú.
ƒVƒ“ƒ|ƒWƒEƒ€EŒ¤‹†‰ïE‘å‰ï“™”•\
Symposiums and Domestic Conferences
[57]
˜aŸ†”Í–¾, ’†–ì‹M”V, Œà‹U, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_, "‰»‡•¨”¼“±‘Ì‚ÌMOVPE‘I‘𬒷‚É‚¨‚¯‚éˆÙí¬’·§Œä", ‰»ŠwHŠw‰ï‘æ69”N‰ï u‰‰—vŽ|W(XX‘åŠw),
C306?, 2004”N3ŒŽ23-25?“ú.
[58]
’†–ì‹M”V, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_, "ŽžŠÔ•Ï’²¬’·‚É‚æ‚éMOVPE•\–Ê”½‰žƒƒJƒjƒYƒ€‚̉ð–¾", ‰»ŠwHŠw‰ï‘æ69”N‰ï u‰‰—vŽ|W(XX‘åŠw),
C306?, 2004”N3ŒŽ23-25?“ú.
[59]’|’†[, ƒ‚[ƒ‰EƒŒƒCƒoƒ“, ’†–ì‹`º, "‘½ƒ‚[ƒhŠ±ÂƒJƒvƒ‰Œ^‘oˆÀ’蔼“±‘̃Œ[ƒU‚ð—p‚¢‚½‘SŒõƒtƒŠƒbƒvEƒtƒƒbƒv“®ì (All optical flip-flop operation using a multimode interference
bistable laser diode)", “dŽqî•ñ’ÊMŠw‰ï‘‡‘å‰ï(“Œ‹žH‹Æ‘åŠw)u‰‰˜_•¶W, C-4-30, p. 358, 2004”N3ŒŽ22-25“ú.
[60]VŒ©—²’j, ¬—ш葾˜Y, ’†–ì‹`º, •ЋËˉë, Œõ‰ª–õK, "‹à‘®Œõ“±”g˜H‚É‚¨‚¯‚éSPP-mode“`”À‘¹Ž¸‚Ì•]‰¿ (Evaluation of SPP-mode loss guided by metal optical
waveguide)", “dŽqî•ñ’ÊMŠw‰ï‘‡‘å‰ï(“Œ‹žH‹Æ‘åŠw)u‰‰˜_•¶W, SC-5-5, p. S-71, 2004”N3ŒŽ22-25“ú.
[61]˜aŸ†”Í–¾, ’†–ì‹M”V, Œà‹U, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_, "‰»‡•¨”¼“±‘Ì‚ÌMOVPE‘I‘𬒷‚É‚¨‚¯‚éˆÙí¬’·§Œä (Abnormal growth control
in MOVPE selective area growth of compound semiconductor)", ‘æ51‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(“Œ‹žH‰È‘åŠw), 28a-YG-7, 2004”N3ŒŽ28“ú.
[62]’†–ì‹M”V, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_,
"MOVPE–@‚É‚¨‚¯‚錋»¬’·’†‚ł̕\–Ê”½‰žƒƒJƒjƒYƒ€‚̉ð–¾(2) (Investigation
of surface reaction mechanism during crystal growth in MOVPE 2)", ‘æ51‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(“Œ‹žH‰È‘åŠw), 28p-YG-1, 2004”N3ŒŽ28“ú.
[63]‹àŽqT, ´…‘å‰ë, ’†–ì‹`º, "InGaAs/InAlAs MQW-EA•Ï’²Ší‚É‚¨‚¯‚éŒõ—U‹N‹üÜ—¦•ω»‚Ì‘ª’è (Photo-induced refractive index change in InGaAs/InAlAs MQW-EA
modulators)", ‘æ51‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(“Œ‹žH‰È‘åŠw), 30p-ZV-1, 2004”N3ŒŽ30“ú.
[64]—›”J, C. ƒJƒ€ƒg[ƒ“ƒLƒbƒeƒBƒNƒ‹, ˜eˆê‘¾˜Y, ™ŽR³˜a, ‘šŠ_K_, ’†–ì‹`º, "‰–‘fŒnICPƒGƒbƒ`ƒ“ƒO‚É‚æ‚éGaN“±”g˜H‚Ìì» (Fabrication of GaN waveguides
using Cl2-based inductively coupled plasma etching)", ‘æ51‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(“Œ‹žH‰È‘åŠw), 30a-ZV-7, 2004”N3ŒŽ30“ú.
[65]“Þ—Ç“cVˆê, ƒ_ƒ‹ƒWƒƒEƒWƒFƒbƒV[, ’”_, ’†–ì‹`º, "“d—¬‹·ó‘w‚ð‚à‚Á‚½ƒŠƒbƒWŒ^”¼“±‘̃Œ[ƒU‚ÌÅ“KÝŒvƒVƒ~ƒ…ƒŒ[ƒVƒ‡ƒ“ (Numerical optimization of ridge waveguide semiconductor lasers
with current confinement structure)", ‘æ51‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(“Œ‹žH‰È‘åŠw), 31p-ZZ-2, 2004”N3ŒŽ31“ú.
[66]’|’†[, ƒ‚[ƒ‰EƒŒƒCƒoƒ“, ’†–ì‹`º, "•ûŒü«Œ‹‡ŠíŒ^”¼“±‘̃Œ[ƒU‚̬Œ^‰»‚É‚æ‚é‘SŒõƒtƒŠƒbƒvEƒtƒƒbƒv‚Ì“Á«‰ü‘P (Improvement of characteristics of all-optical flip-flop using a
compact directionally-coupled bistable laser diode)", ‘æ51‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(“Œ‹žH‰È‘åŠw), 31a-ZK-9, 2004”N3ŒŽ31“ú.
[67]‘å’Ëß•¶, ’†–ì‹`º, "ƒ}ƒXƒgƒ‰ƒ“ƒXƒ|[ƒgInAsP—ÊŽq×ü‚̃oƒ“ƒh\‘¢‚ɑ΂·‚é‚Ђ¸‚݂̌ø‰Ê (Strain effect on the band structure of mass-transported InAsP
quantum wires)", ‘æ51‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(“Œ‹žH‰È‘åŠw), 31a-ZZ-2, 2004”N3ŒŽ31“ú.
[68]’†–ì‹`º, "(µ‘Òu‰‰) “ú–{‚É‚¨‚¯‚éƒtƒHƒgƒjƒbƒNƒlƒbƒgƒ[ƒNƒfƒoƒCƒXŠJ”", “dŽqî•ñ’ÊMŠw‰ïƒtƒHƒgƒjƒbƒNƒlƒbƒgƒ[ƒNEƒ[ƒNƒVƒ‡ƒbƒv, “Œ‹žH‹Æ‘åŠw, 2004”N4ŒŽ12“ú.
[69]Eric Gouardes and
Yoshiaki Nakano, "Dependence of an optical burst switching node
transparency on mux/demux arrayed waveguide grating (AWG”g’·‘½dE•ª—£‚É‚æ‚éŒõƒo[ƒXƒgƒXƒCƒbƒ`ƒ“ƒOƒm[ƒh‚Ì“§–¾«‚̕ω»)", “dŽqî•ñ’ÊMŠw‰ï‹ZpŒ¤‹†•ñ(ƒtƒHƒgƒjƒbƒNƒlƒbƒgƒ[ƒNŒ¤‹†‰ï), PN2004-48, pp. 81-85, 2004”N8ŒŽ20“ú.
[70]˜aŸ†”Í–¾, ’†–ì‹M”V, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_, "‰»‡•¨”¼“±‘Ì‚ÌMOVPE‘I‘𬒷‚É‚¨‚¯‚é•\–ÊŠgŽU‚Ì–ðŠ„ (Role of surface diffusion during selective area MOVPE growth of
compound semiconductor)", ‘æ65‰ñ‰ž—p•¨—Šw‰ïŠwpu‰‰‰ï(“Œ–kŠw‰@‘åŠw), 1a-P1-28, 2004”N9ŒŽ1“ú.
[71]’†–ì‹M”V, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_,
"MOVPE–@‚É‚¨‚¯‚錋»¬’·’†‚ł̕\–Ê”½‰žƒƒJƒjƒYƒ€‚̉ð–¾(3) (Investigation
of surface reaction mechanism during crystal growth in MOVPE 3)", ‘æ65‰ñ‰ž—p•¨—Šw‰ïŠwpu‰‰‰ï(“Œ–kŠw‰@‘åŠw), 1a-P1-20, 2004”N9ŒŽ1“ú.
[72]ˆ¢”g—ÇŠî, r쑾˜Y, ˆäŽè’qË, ™ŽR³˜a, ´…‘å‰ë, ‘šŠ_K_, ’†–ì‹`º, ‰H˜HL•v, ‘½“c–M—Y, "GaN‚̃KƒXŒðŒÝ‹Ÿ‹‹ECR-RIE‚É‚¨‚¯‚éƒGƒbƒ`ƒ“ƒO‘¬“xEƒGƒbƒ`ƒ“ƒO–Ê•½’R«‚̉ü‘P (High etch
rate and improved etched surface morphology in ECR -RIE of GaN by cyclic
injection of etching gases)", ‘æ65‰ñ‰ž—p•¨—Šw‰ïŠwpu‰‰‰ï(“Œ–kŠw‰@‘åŠw), 1p-ZK-8, 2004”N9ŒŽ1“ú.
[73]‘vŠw—Ç, ’£äj, “ñŒû®Ž÷, ’†–ì‹`º,
"MOVPE‘I‘𬒷‚É‚æ‚é‘SŒõƒXƒCƒbƒ`‚Ì“®“Á« (Dynamic switching
performance of all-optical switches fabricated with selective-area
MOVPE)", ‘æ65‰ñ‰ž—p•¨—Šw‰ïŠwpu‰‰‰ï(“Œ–kŠw‰@‘åŠw), 2a-ZM-8, 2004”N9ŒŽ2“ú.
[74]´…‘å‰ë, ’†–ì‹`º, "”ñ‘Š”½‘¹Ž¸‚ÉŠî‚ÂTEƒ‚[ƒh”¼“±‘Ì“±”g˜HŒ^ŒõƒAƒCƒ\ƒŒ[ƒ^‚̉ü—ÇŽŽì (Improved fabrication of a TE mode semiconductor-waveguide-type
optical isolator based on the non-reciprocal loss shift)", ‘æ65‰ñ‰ž—p•¨—Šw‰ïŠwpu‰‰‰ï(“Œ–kŠw‰@‘åŠw), 2p-ZM-7, 2004”N9ŒŽ2“ú.
[75]Abdullah Al Amin, Kenji
Sakurai, Takashi Sakurai, Masakazu Sugiyama, and Yoshiaki Nakano,
"Fabrication of double-etched waveguides for compact and low-loss InP
photonic circuits (ƒRƒ“ƒpƒNƒg‚Å’á‘¹Ž¸‚ÈInPŒõ‰ñ˜H‚Ì‚½‚ß‚Ì2‰ñƒGƒbƒ`“±”g˜H‚ÌŽŽì)", ‘æ65‰ñ‰ž—p•¨—Šw‰ïŠwpu‰‰‰ï(“Œ–kŠw‰@‘åŠw), 2a-ZM-7, 2004”N9ŒŽ2“ú.
[76]Chaiyasit
Kumtornkittikul, Ning Li, Ichictaro Waki, Hiroshi Otani, Masakazu Sugiyama,
and@ Yoshiaki Nakano, "GaN-based
waveguide structure for ultrafast photonic devices utilizing intersubband
absorption (GaNŒnƒTƒuƒoƒ“ƒhŠÔ‹zŽû’´‚‘¬ŒõƒfƒoƒCƒX‚ÉŒü‚¯‚½“±”g˜H‚ÌÝŒv)", “dŽqî•ñ’ÊMŠw‰ïƒGƒŒƒNƒgƒƒjƒNƒXƒ\ƒTƒCƒGƒeƒB‘å‰ï(“¿“‡‘åŠw)u‰‰˜_•¶W, C-4-17, p. 271, 2004”N9ŒŽ21“ú.
[77]´…‘å‰ë, ’†–ì‹`º, "”ñ‘Š”½‘¹Ž¸•ω»‚ÉŠî‚ÂTEƒ‚[ƒh”¼“±‘Ì“±”g˜HŒ^ŒõƒAƒCƒ\ƒŒ[ƒ^", ‘æ28‰ñ“ú–{‰ž—pŽ¥‹CŠw‰ïŠwpu‰‰ŠT—vW, 24aF-2, p. 516, ‰«“êƒRƒ“ƒxƒ“ƒVƒ‡ƒ“ƒZƒ“ƒ^[, 2004”N9ŒŽ21“ú`24“ú.
[78]ŸNˆäŒªŽi, Al Amin
Abdullah, ŸNˆä‹MŽu, ™ŽR³˜a, ’†–ì‹`º, "InPŒnƒAƒŒƒC“±”g˜H‡•ª”gŠí‚ÌŽŽì‚ÆMOVPE‘I‘𬒷‚É‚æ‚é”\“®‘fŽqWω»‚ÌŒŸ“¢ (Fabrication of InP-based arrayed waveguide gratings and
integration trial with active devices by MOVPE selective-area growth)", “dŽqî•ñ’ÊMŠw‰ï‹ZpŒ¤‹†•ñ(ƒtƒHƒgƒjƒbƒNƒlƒbƒgƒ[ƒNŒ¤‹†‰ï), PN2004-99, pp. 7-10, 2005”N1ŒŽ28“ú.
[79]‘vŠC, ‘vŠw—Ç, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_, "‘I‘𬒷‚ð—p‚¢‚½•\–Ê”½‰ž‘¬“x‚̉ðÍ:GaAs MOCVD‚É‚¨‚¯‚鉷“xEŠî”–ʕûˆÊ‚ÌŒø‰Ê", ‰»ŠwHŠw‰ï‘æ70”N‰ï u‰‰—vŽ|W(–¼ŒÃ‰®‘åŠw), M302, 489, 2005”N3ŒŽ24“ú.
[80]’†–ì‹M”V, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_, "ŽžŠÔ•Ï’²¬’·‚É‚æ‚鉻‡•¨”¼“±‘ÌMOVPE–@‚Ì•\–Ê”½‰žƒƒJƒjƒYƒ€‰ðÍ", ‰»ŠwHŠw‰ï‘æ70”N‰ï u‰‰—vŽ|W(–¼ŒÃ‰®‘åŠw),
M303, 494, 2005”N3ŒŽ24“ú.
[81]‰–“c—Ï–ç, ™ŽR³˜a, ‘šŠ_K_, ’†–ì‹`º,
"InGaAsP‘I‘𬒷‚É‚¨‚¯‚é—ÊŽqˆäŒË”Œõ”g’·‚Ì—\‘ª", ‰»ŠwHŠw‰ï‘æ70”N‰ï u‰‰—vŽ|W(–¼ŒÃ‰®‘åŠw), M301,
2005”N3ŒŽ24“ú.
[82]‘v ŠCC‘v Šw—ÇC™ŽR³˜aC’†–ì‹`ºC‘šŠ_K_Ch‘I‘𬒷‚ð—p‚¢‚½•\–Ê”½‰ž‘¬“x‚̉ðÍ:GaAs MOCVD‚É‚¨‚¯‚鉷“xEŠî”–ʕûˆÊ‚ÌŒø‰ÊhC‰»ŠwHŠw‰ï‘æ70”N‰ï u‰‰—vŽ|W(–¼ŒÃ‰®‘åŠw), M302, 2005”N3ŒŽ24“ú.
[83]’†–ì‹M”VC™ŽR³˜aC’†–ì‹`ºC‘šŠ_K_ChŽžŠÔ•Ï’²¬’·‚É‚æ‚鉻‡•¨”¼“±‘ÌMOVPE–@‚Ì•\–Ê”½‰žƒƒJƒjƒYƒ€‰ðÍhC ‰»ŠwHŠw‰ï‘æ70”N‰ï u‰‰—vŽ|W(–¼ŒÃ‰®‘åŠw), M303, 2005”N3ŒŽ24“ú.
[84]”¿‘«‰p“ñC•½“c—m‰îC´…ò‰îC“¡] ½C™ŽR³˜aCK“c´ˆê˜YCh’´—ÕŠE…’†‚̌ő̗±ŽqŒQ‚ÌŽ_‰»”½‰ž‰ðÍhC‰»ŠwHŠw‰ï‘æ70”N‰ï u‰‰—vŽ|W(–¼ŒÃ‰®‘åŠw), C115,
2005”N3ŒŽ24“ú.
[85]•S£ Œ’C‘å‹v•Û’qOC™ŽR³˜aC‘šŠ_K_g’´—ÕŠECO2‚ð—p‚¢‚½Cu”––Œ‘ÍÏ:»–Œ‰ß’ö‚̉Ž‹‰»(2)hC‰»ŠwHŠw‰ï‘æ70”N‰ï u‰‰—vŽ|W(–¼ŒÃ‰®‘åŠw), A315,
2005”N3ŒŽ24“ú.
[86]Έä’B–çC•S£ Œ’C™ŽR³˜aC‘šŠ_K_Cg’´—ÕŠECO2‚ð—p‚¢‚½Ta‰»‡•¨”––ŒŒ`¬hC ‰»ŠwHŠw‰ï‘æ70”N‰ï
u‰‰—vŽ|W(–¼ŒÃ‰®‘åŠw), A316, 2005”N3ŒŽ24“ú.
[87]ŸNˆäŒªŽi, ƒAƒ‹ƒAƒ~ƒ“
ƒAƒuƒhƒDƒbƒ‰[, ‰–“c—Ï–ç, ™ŽR³˜a, ’†–ì‹`º, "‘I‘𬒷‚É‚æ‚éŒõ‡•ª”gŠí‚Æ”¼“±‘ÌŒõ‘•Ší‚ÌWω» (Selective area grown semiconductor optical amplifier integrated
demultiplexer)", “dŽqî•ñ’ÊMŠw‰ï‘‡‘å‰ï(‘åã‘åŠw)u‰‰˜_•¶W, C-3-19, p. 189, 2005”N3ŒŽ21“ú.
[88]Lˆä“T—Ç, ‰’•”’‰, ’|’†[, “¡“c”Ž”V, ’†–ì‹`º, "ŒõIC—p‚–§“xƒsƒbƒ`•ÏŠ·Œõƒtƒ@ƒCƒoƒAƒŒƒC"OPLEAF"‚ÌŠJ” (Development of
"OPLEAF", pitch-conversion dense fiber array for photonic integrated
circuits)", “dŽqî•ñ’ÊMŠw‰ï‘‡‘å‰ï(‘åã‘åŠw)u‰‰˜_•¶W, C-3-30, p. 200, 2005”N3ŒŽ22“ú.
[89]Lˆä“T—Ç, ‰’•”’‰, “¡“c”Ž”V, ’|’†[, ’†–ì‹`º, "ŒõIC—p‚–§“xƒsƒbƒ`•ÏŠ·Œõƒtƒ@ƒCƒoƒAƒŒƒC‚ÌŠJ” (Development of pitch conversion optical fiber array for connecting
optical IC and fibers)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 29a-ZR-8, 2005”N3ŒŽ29“ú.
[90]´…‘å‰ë, ’†–ì‹`º, "”¼“±‘Ì^‹Ž¥«‹à‘®ƒnƒCƒuƒŠƒbƒh‚É‚æ‚éŒõ’ÊM”g’·‘Ñ“±”g˜HŒ^ŒõƒAƒCƒ\ƒŒ[ƒ^(Waveguide
optical isolator using semiconductor/ferromagnet hybrid structure for optical
telecommunication)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 30p-YD-8, 2005”N3ŒŽ30“ú.
[91]’|’†[, ƒ‚[ƒ‰EƒŒƒCƒoƒ“, ’†–ì‹`º, "‘½ƒ‚[ƒhŠ±ÂƒJƒvƒ‰Œ^‘oˆÀ’背[ƒU‚¨‚æ‚Ñ”¼“±‘ÌŒõ‘•Ší‚ð—p‚¢‚½M†Ä¶”g’·•ÏŠ·Ší‚ÌŒŸ“¢ (Regenerative wavelength conversion using multimode interference
bistable laser diodes with semiconductor optical amplifiers)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw),
31p-ZQ-7, 2005”N3ŒŽ31“ú.
[92]´…‘å‰ë, ’†–ì‹`º, "InGaAsP/InP”¼“±‘ÌŒõ‘•Ší“±”g˜H‚É‚¨‚¯‚éTEƒ‚[ƒh”ñ‘Š”½‘¹Ž¸Œ»Û‚̉‚ÌŽÀØ (First demonstration of TE mode nonreciprocal propagation in an
InGaAsP/InP active waveguide)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 31a-ZQ-10, 2005”N3ŒŽ31“ú.
[93]ƒCƒbƒgƒt[ƒ`ƒ‡ƒ“, ‘vŠw—Ç, ’£äj, ‘vŠC, ™ŽR³˜a, ’†–ì ‹`º, "ƒ}ƒbƒnEƒcƒFƒ“ƒ_Œ^SOA‘SŒõƒXƒCƒbƒ`‚É‚¨‚¯‚é4ƒoƒ“ƒhƒMƒƒƒbƒvƒ‚ƒmƒŠƒVƒbƒNWÏ (Four-Bandgap Energy Monolithic Integration in an SOA-MZI
All-Optical Switch)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 31p-ZQ-10, 2005”N3ŒŽ31“ú.
[94]‘vŠw—Ç, ƒCƒbƒgƒt[ƒ`ƒ‡ƒ“, ’£äj, ‘vŠC, ™ŽR³˜a, ’†–ì ‹`º, "MOVPE‘I‘𬒷‚É‚æ‚é‘SŒõƒXƒCƒbƒ`‚ÌOTDM DEMUX“®ì (OTDM demultiplexing with
all-optical switches fabricated by selective-area MOVPE)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw),
31p-ZQ-9, 2005”N3ŒŽ31“ú.
[95]‰–“c—Ï–ç, ƒAƒ‹ƒAƒ~ƒ“
ƒAƒuƒhƒDƒ‰[, ™ŽR³˜a, ‘šŠ_K_, ’†–ì‹`º, "MOVPE‘I‘𬒷‚̃‚ƒfƒŠƒ“ƒO‚ð—p‚¢‚½InGaAsP/InPŒn‘I‘𬒷‚Ì“Á«—\‘ª (Predictive modeling
of the properties of InGaAsP/InP grown by selective area metal-organic vapor
phase epitaxy)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 31a-ZM-4, 2005”N3ŒŽ31“ú.
[96]‰J‹{’qG, ´…‘å‰ë, ’†–ì‹`º, "TMƒ‚[ƒh”ñ‘Š”½“`”À‘¹Ž¸“±”g˜H‚Ì컂ƎÀØ (Fabrication and demonstration of a TM mode nonreciprocal
propagation loss waveguide)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 31a-ZQ-11, 2005”N3ŒŽ31“ú.
[97]‘å’J—m, ƒ`ƒƒƒCƒ„ƒXƒBƒbƒgƒJƒ€ƒgƒD[ƒ“ƒLƒeƒBƒbƒNƒ‹, ™ŽR³˜a, ’†–ì‹`º,
"MOVPE¬’·GaN/AlN‘½d—ÊŽqˆäŒË’†‚̃Tƒuƒoƒ“ƒhŠÔ‘JˆÚ‚ÉŠñ—^‚·‚é“dŽq–§“x‚Ì•]‰¿ (Estimation of carrier density contributing to intersuband
transition in AlN/GaN MQWs grown by MOVPE)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 31p-L-2, 2005”N3ŒŽ31“ú.
[98]‘vŠC, ‘vŠw—Ç, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_, "MOVPE GaAs‘I‘𬒷‚Ì•\–Ê”½‰ž‚É‚¨‚¯‚éŠî”ÂoffŠp‚̉e‹¿ (The influence of substrate misorientation on surface reaction
kinetics of GaAs selective area MOVPE)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw), 31a-ZM-3, 2005”N3ŒŽ31“ú.
[99]’†–ì‹M”V, ™ŽR³˜a, ’†–ì‹`º, ‘šŠ_K_,
"MOVPE–@‚É‚¨‚¯‚錋»¬’·’†‚ł̕\–Ê”½‰žƒƒJƒjƒYƒ€‚̉ð–¾(4) (Investigation
of surface reaction mechanism during crystal growth in MOVPE 4)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw),
1a-ZM-1, 2005”N4ŒŽ1“ú.
[100]
’£äj, ‘vŠw—Ç, ƒCƒbƒgƒt[ƒ`ƒ‡ƒ“, ’|’†[, ™ŽR³˜a, ’†–ì ‹`º,
"GRIN-SCH\‘¢‚É‚æ‚éMOVPE‘I‘𬒷Œõ“±”g˜H‚Ì“à•”‘¹Ž¸’ጸ (Internal loss reduction by GRIN-SCH structure in optical
waveguides prepared using MOVPE selective area growth)", ‘æ52‰ñ‰ž—p•¨—ŠwŠÖŒW˜A‡u‰‰‰ï(é‹Ê‘åŠw),
1p-ZQ-4, 2005”N4ŒŽ1“ú.
‚»‚Ì‘¼
Others
[101]
Yoshiaki
Nakano, Masakazu Sugiyama, Hiromasa Shimizu, Eric Gouardes, Mitsuru Takenaka,
Maura Raburn, Jesse Darja, Foocheong Yit, and Xiaoping Zhou, "Semiconductor
photonic networking devices Ðresearch toward
digital photonics", Proceedings of International Symposium on Electronics
for Future Generations, pp. 437-442, Tokyo, March 10-11, 2004.
[102]
Masakazu
Sugiyama, Yoshiaki Nakano, Yukihiro Shimogaki, Ichitaro Waki, Ho-Jin Oh,
Xueliang Song, Abdullah Al Amin, Takafumi Ohtsuka, Takayuki Nakano, and
Chaiyasit Kumtornkittikul, "Advanced metalorganic vapor phase epitaxy
technology for monolithic integration of photonic devices", Proceedings of
International Symposium on Electronics for Future Generations, pp. 151-155,
Tokyo, March 10-11, 2004.
[103]
’†–ì‹`º, "2004”NŒõƒtƒ@ƒCƒo[’ÊM‰ï‹c(OFC2004)‚ÌŠT—v", ƒIƒvƒgƒƒjƒNƒX,
vol. 23, no. 5, pp. 110-112, 2004”N5ŒŽ10“ú.
[104]
’†–ì‹`º, ’|’†[,
"ƒŠƒ|[ƒg‘Û‰ï‹c OFC2004 (ƒfƒoƒCƒX)",
ŒõŽY‹Æ‹ZpU‹»‹¦‰ï Opto News (ƒIƒvƒgƒjƒ…[ƒY), no.4 (’ÊŠª142†), pp.
38-39, 2004”N7ŒŽ1“ú.
[105]
Xueliang Song,
Foo Cheong Yit, Zhenrui Zhang, Masakazu Sugiyama, and Yoshiaki Nakano,
"SOA-integrated MZI all-optical switches fabricated by selective area
MOVPE", Abstracts of the 2004 JST CREST Symposium on Functional Evolution
of Materials and Devices Based on Electron/Photon Related Phenomena (FEMD), p.
65, Tokyo, September 29-30, 2004.
[106]
Hiromasa
Shimizu, Tomohiro Amemiya, Yoshiaki Nakano, and Masaaki Tanaka,
"Fabrication of a TE mode semiconductor waveguide-type optical isolator
based on nonreciprocal loss", Abstracts of the 2004 JST CREST Symposium on
Functional Evolution of Materials and Devices Based on Electron/Photon Related
Phenomena (FEMD), p. 64, Tokyo, September 29-30, 2004.
[107]
Chaiyasit
Kumturnkittikul, Hiroshi Otani, Yukihiro Shimogaki, Masakazu Sugiyama, and
Yoshiaki Nakano, "MOVPE growth of GaN/AlN multiple quantum wells and
waveguide fabrication for ultrafast photonic devices", Abstracts of the
2004 JST CREST Symposium on Functional Evolution of Materials and Devices Based
on Electron/Photon Related Phenomena (FEMD), p. 63, Tokyo, September 29-30, 2004.
[108]
Yoshiaki
Nakano, "Innovative photon-controlling devices based on artificial optical
properties of semiconductors -exploration towards digital photonics",
Abstracts of the 2004 JST CREST Symposium on Functional Evolution of Materials
and Devices Based on Electron/Photon Related Phenomena (FEMD), pp. 56-59,
Tokyo, September 29-30, 2004.
[109]
’†–ì‹`º, "Åæ’[ƒvƒƒZƒX‹Zp‚Å‘n‚锼“±‘ÌŒõƒfƒoƒCƒXWωñ˜H", æ’[’m‹@”\Þ—¿ƒfƒoƒCƒXƒ‰ƒ{ƒ‰ƒgƒŠ[ƒYÝ—§‹L”OƒtƒH[ƒ‰ƒ€. 2004”N11ŒŽ5“ú.
[110]
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